Xiaoming XieShanghai Institute of Microsystem and Information Technology, CAS, China
Prof. Xiaoming Xie is a research professor at Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, vice dean of the State Key Laboratory of Functional Materials for Informatics, leader of the National Science and Technology Major Project “Wafer scale graphene material and devices”. His major research fields include graphene, superconductor and graphene/superconductor hetero-structures with special focuses on synthesis of single crystalline graphene on metallic and dielectric substrates. His group has managed to synthesize centimeter-sized single crystal graphene domain on alloy substrate with controlled nucleation site. He has published a series of papers on CVD growth of graphene on h-BN from principle demonstration to ultrafast growth, realizing precisely aligned single crystalline grains up to 20 mm with an ultra-high growth rate of ~ 1 mm/minute.
Title:CVD Graphene for Electronics Applications
SymposiumApplication of Graphene Film
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Abstract
There are a number of technical barriers to overcome before graphene can play a major role in electronic applications. These barriers include the fabrication of graphene wafer, band-gap opening and control. In this talk, we will present our results on the synthesis of single crystalline graphene wafer and large domain-sized graphene with AB stacking order. By introducing carbon precursor locally on the Cu85Ni15 alloy with moderate carbon solubility, we succeed in creating one single nucleus on the wafer-sized substrate. Single nucleus regime was maintained during the growth period, following a new is other mal segregation mechanism. Carbon stored in the substrate accelerates the growth, yielding in a 1.5 inch monolayer single crystalline wafer in only 2.5 hours. Single crystalline graphene wafer could also be synthesized by aligned growth of graphene islands on the Ge(110) substrate. The lattice matching effect existing at the interface between the atomic steps on the Ge(110) surface and the graphene island edges guide the unidirectional alignment of graphene islands, which stiches seamlessly into a single crystalline graphene wafer. Growth of AB-stacked graphene was demonstrated by encaging Cu85Ni15 substrate with copper foils. The synergic effects of Cu85Ni15 and copper vapor evaporated from copper foil yield a fast growth of ~ 300 m bilayer graphene in ~10 minutes. The copper vapor reduces the growth rate of the first layer of graphene while the carbon dissolved in the alloy boosts the growth of the subsequently developed second graphene layer with AB-stacking order. The success lies mainly in the largely reduced disparity of growth rates of the first and the second layer, one of the major reasons preventing the fast growth of large-domain-sized AB-stacked bilayer graphene. We will also briefly present our latest results on the synthesis of edge-controlled graphene nano-ribbon.